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Atomic Oxygen Effects of Polyimide/Silica Hybrid Films in Low Earth Orbit Environment

机译:低地球轨道环境中聚酰亚胺/二氧化硅杂化膜的原子氧效应

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To improve AO resistance of polyimide,a type of polyimide/silica (PI/SiO2) hybrid film was prepared by the sol-gel process. The coupling agent p-aminophenyltrimeth- oxysilane (APTMOS) was chosen to enhance the compatibility between the polyimide (PI) and silica (SiO2). AO resistance of the PI/SiO2 hybrid films were tested in the ground-based simulation AO facility. The erosion yield of the films was 4.7x10-26 cm3/atom,decreased by two orders of magnitude compared with the value of 3.0x10-24 cm3/atom ofthe polyimide film. Results from FTIR,XPS,AFM on AO treated polyimide/silica hybrid films indicate the formation of a passivating inorganic SiO2 layer. The layer significantly retards the penetration of oxygen atoms,preventing further degradation of the polymer in the bulk. The addition of SiO2 in polyimide does not significantly alter the optical properties of polyimide during AO exposure.
机译:为了提高聚酰亚胺的抗AO性能,采用溶胶-凝胶法制备了一种聚酰亚胺/二氧化硅(PI / SiO2)杂化膜。选择偶联剂对氨基苯基三甲氧基硅烷(APTMOS)以增强聚酰亚胺(PI)和二氧化硅(SiO2)之间的相容性。在基于地面的模拟AO设备中测试了PI / SiO2杂化膜的AO电阻。薄膜的腐蚀产量为4.7x10-26 cm3 /原子,与聚酰亚胺薄膜的3.0x10-24 cm3 /原子相比降低了两个数量级。 AO处理的聚酰亚胺/二氧化硅杂化膜上的FTIR,XPS,AFM结果表明,形成了钝化无机SiO2层。该层显着阻碍了氧原子的渗透,从而防止了本体中聚合物的进一步降解。在AO曝光期间,在聚酰亚胺中添加SiO2不会显着改变聚酰亚胺的光学性能。

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