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Doping of Al_xGa_(1-x)N alloys

机译:掺杂Al_xGa_(1-x)N合金

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摘要

We have investigated the doping of Al_xGa_(1-x)N alloys on the basis of density-functional-pseudopotential calculations for native point defects and dopant impurities. We have identified two possible two possible causes for the experimentally observed decrease in n-type conductivity for x >0.4: (1) in the case of doping with oxygen, a DX transition that converts the shallow donor into a deep level; and (2) compensation by cation vacancies. For p-type doping, the reduction in doping efficiency with increasing x is attributed to (1) compensation by nitrogen vacancies; and (2) an increase in the Mg acceptor ionization energy. We also investigated a number of alternative acceptor impurities; none, however, exhibit overall characteristics superior to those of Mg. Only beryllium emerged as a possible candidate, though it may be hampered by compensation due to Be interstitial donors.
机译:我们已经基于对自然点缺陷和掺杂杂质的密度泛函伪电势计算研究了Al_xGa_(1-x)N合金的掺杂。对于x> 0.4,我们已经确定了实验观察到的n型电导率降低的两个可能的两个原因:(1)在掺杂氧的情况下,DX转换将浅的供体转化为深能级; (2)阳离子空缺补偿。对于p型掺杂,随着x的增加,掺杂效率的降低归因于(1)氮空位的补偿; (2)Mg受体电离能的增加。我们还研究了许多其他受体杂质。但是,没有一种合金的整体特性优于镁。尽管铍可能是间质捐赠者,但可能会因补偿而受到阻碍,因此只有铍成为可能的候选者。

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