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Arsenic deactivation in silicon

机译:硅中的砷失活

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摘要

In this paper we examine the properties of arsenic in silicon, using ab initio calculations and a statistical theory. Good agreement is found between theory and experiment for the electronic concentration as a function of temperautre and total arsenic concentration. We show that for low arsenic concentrations, full activation is the equilibrium condition. In equilibrium, the neutral complex composed of a lattice vacancy surrounded by four arsenic (VAs_4) is the dominant means by which high concentrations of arsenic are rendered inactive. Under constrained equilibrium conditions in which VAs_4 cluster formation is prohibited, we show that VAs_3Si_1 cluster populations increase dramatically and can account for nearly the same degree of compensation as the VAs_4 clusters. Even VAs_2 clusters alone can account for substantial deactivation in the absence of VAs_4 clusters. These smaller complexes are essential not only to the establishment of equilibrium, since SiAs_4 clusters are extremely rare, but can also explain some degree of deactivation, even if the formation of VAs_4 clusters are kinetically inhibited.
机译:在本文中,我们使用从头算和统计理论来研究硅中砷的性质。在理论和实验之间发现了电子浓度随温度和总砷浓度变化的良好一致性。我们表明,对于低砷浓度,完全活化是平衡条件。在平衡状态下,由被四个砷(VAs_4)包围的晶格空位组成的中性复合物是使高浓度砷失活的主要手段。在禁止VAs_4簇形成的受约束平衡条件下,我们表明VAs_3Si_1簇的数量急剧增加,并且可以补偿与VAs_4簇几乎相同的补偿程度。在没有VAs_4群集的情况下,即使仅VAs_2群集也可导致大量停用。这些较小的配合物不仅对建立平衡至关重要,因为SiAs_4团簇极为罕见,而且即使VAs_4团簇的形成受到动力学抑制,也可以解释一定程度的失活。

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