首页> 外文会议>Symposium Proceedings vol.831; Symposium on GaN, AIN, InN and Their Alloys; 20041129-1203; Boston,MA(US) >Comparative Study of GaN Based Light Emitting Devices Grown on Sapphire and GaN Substrates
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Comparative Study of GaN Based Light Emitting Devices Grown on Sapphire and GaN Substrates

机译:在蓝宝石和GaN衬底上生长的GaN基发光器件的比较研究

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摘要

The homoeptaxial growth of GaN based devices has advantages against the heteroepi-taxial realization on substrates such as sapphire or SiC, since heteroepitaxy implies a lot of problems like lattice mismatch, different thermal expansion coefficients, and needs an extensive optimization of the growth at the heterointerface. In this paper we will discuss GaN based light emitting devices grown by homoepitaxy in comparison to devices grown on sapphire. We will show the differences in device performance, device processing and the influence of the thermal resistivity on the devices.
机译:GaN基器件的同相生长相对于蓝宝石或SiC等衬底上的异质外延生长具有优势,因为异质外延意味着许多问题,例如晶格失配,不同的热膨胀系数,并且需要对异质界面处的生长进行广泛的优化。在本文中,我们将讨论通过同外延生长的GaN基发光器件与在蓝宝石上生长的器件相比。我们将展示器件性能,器件加工以及热阻对器件的影响方面的差异。

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