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Nanolithographic Manipulated Cutting of Aligned Metal Oxide Nanowires

机译:纳米光刻操作的对准金属氧化物纳米线切割。

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摘要

Controlling the characteristics of nanowires in order to later construct nanoarchitecture and nanocomponents for nanodevice and nanosensor applications is essential. Metal oxide nanowires are aligned using the Langmuir-Blodgett (LB) technique to uniaxially compress the nanowires. A surfactant monolayer of metal oxide nanowires is fabricated, and then compressed on an aqueous subphase. The compression yields an array of aligned nanowires, which is transferred to a planar substrate. Cutting areas of the array are defined by electron beam nanolithography. After an etching process, it is shown that the metal oxide nanowires have been successfully cut. With further refinement of this technique, the nanowires can be used to construct basic building blocks of nanodevices and nanosensors.
机译:控制纳米线的特性以便以后构造用于纳米器件和纳米传感器应用的纳米体系结构和纳米组件至关重要。使用Langmuir-Blodgett(LB)技术对齐金属氧化物纳米线,以单轴压缩纳米线。制备金属氧化物纳米线的表面活性剂单层,然后在含水子相上压缩。压缩产生排列的纳米线阵列,其被转移到平面基板上。阵列的切割区域通过电子束纳米光刻法定义。在蚀刻过程之后,显示出金属氧化物纳米线已被成功切割。随着这项技术的进一步完善,纳米线可用于构建纳米器件和纳米传感器的基本构造块。

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