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首页> 外文期刊>ACS nano >A Template and Catalyst-Free Metal-Etching-Oxidation Method to Synthesize Aligned Oxide Nanowire Arrays: NiO as an Example
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A Template and Catalyst-Free Metal-Etching-Oxidation Method to Synthesize Aligned Oxide Nanowire Arrays: NiO as an Example

机译:模板和无催化剂的金属刻蚀氧化方法合成取向的氧化物纳米线阵列:以NiO为例

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摘要

Although NiO is one of the canonical functional binary oxides, there has been no report so far on the effective fabrication of aligned single crystalline NiO nanowire arrays. Here we report a novel vapor-based metal-etching-oxidation method to synthesize high-quality NiO nanowire arrays with good vertical alignment and morphology control. In this method, Ni foils are used as both the substrates and the nickel source; NiCl2 powder serves as the additional Ni source and provides Cl-2 to initiate mild etching. No template is deliberately employed; instead a nanograined NiO scale formed on the NiO foil guides the vapor infiltration and assists the self-assembled growth of NiO nanowires via a novel process comprising simultaneous Cl-2 etching and gentle oxidation. Furthermore, using CoO nanowires and Co-doped NiO as examples, we show that this general method can be employed to produce nanowires of other oxides as well as the doped counterparts.
机译:尽管NiO是典型的功能性二元氧化物之一,但迄今尚无关于有效制造取向单晶NiO纳米线阵列的报道。在这里,我们报告了一种新颖的基于蒸汽的金属蚀刻氧化方法,以合成具有良好垂直排列和形态控制的高质量NiO纳米线阵列。在这种方法中,镍箔既用作衬底又用作镍源。 NiCl2粉末用作附加的Ni源,并提供Cl-2来引发温和的蚀刻。没有故意使用模板;取而代之的是,在NiO箔片上形成的纳米粒度NiO鳞片可引导蒸气渗透,并通过包括同时进行Cl-2蚀刻和轻度氧化的新工艺,帮助NiO纳米线的自组装生长。此外,以CoO纳米线和Co掺杂的NiO为例,我们证明了这种通用方法可用于生产其他氧化物的纳米线以及掺杂的对应物。

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