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Fine-Pitch UBM Pad Metallization and Flip-Chip Assembly for Plane Arrays Interconnection

机译:细间距UBM焊盘金属化和倒装芯片组件,用于平面阵列互连

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We have developed and successfully obtained stable and reliable processes in our labs for metallization and pad definition of passivated Si substrates for microelectronic flip-chip assembly with solder bumps, applicable to high-density interconnection technology. Patterned samples were prepared with aluminum pads on Si/SiO2 over which the UBM multilayer metals were deposited. Pads are 90×90micron∧2 with 185micron pitch. All metal layers show good stability and adherence, and the final processes have good reproducibility and stability. A flip-chip assembly using solder micro-bumps deposited over the pads was used to demonstrate stability and reliability of the process. This set of processes -metallization, pad definition and flip-chip assembly - will next be applied to functional devices.
机译:我们已经在实验室中开发并成功获得稳定可靠的工艺,用于钝化Si基板的金属化和焊盘定义,该工艺用于带有焊料凸点的微电子倒装芯片组装,适用于高密度互连技术。使用在Si / SiO2上的铝垫制备图案化的样品,在其上沉积UBM多层金属。焊盘为90×90微米×2,间距为185微米。所有金属层均显示出良好的稳定性和附着力,并且最终工艺具有良好的可重复性和稳定性。使用在焊盘上沉积的焊料微凸块的倒装芯片组件来证明该过程的稳定性和可靠性。这套工艺-金属化,焊盘定义和倒装芯片组装-接下来将应用于功能器件。

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