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Electroluminescence study of Si-Si_1-x/Si_1-yC_y-Si p-i-n diode structures

机译:Si-Si_1-x / Si_1-yC_y-Si p-i-n二极管结构的电致发光研究

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摘要

The electroluminescence from p-i-n diode structures with Si_1-yC_y/Si_1-xGe_x layers in the depletion region has been studied. Emission attributed to an overlap of the wavefunction associated with electrons confined in the Si_1-xC_y layer and the wavefunction associated with holes confined in the Si_1-xGe_x layer has been observed. For low injection currents, emission due to recombination occurring in the Si_1-xGe_x layer is more dominant. For structures with higher C concentration, the interface related emission can persist up to higher temperatures.
机译:研究了耗尽区中具有Si_1-yC_y / Si_1-xGe_x层的p-i-n二极管结构的电致发光。已经观察到归因于与限制在Si_1-xC_y层中的电子相关的波函数和与限制在Si_1-xGe_x层中的空穴相关的波函数的重叠的发射。对于低注入电流,由于在Si_1-xGe_x层中发生重组而产生的发射更为主要。对于具有较高C浓度的结构,与界面有关的发射可以持续到更高的温度。

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