首页> 外文会议>Symposium on materials and devices for silicon-based optoelectronics >Electroluminescence study of Si-Si_1-x/Si_1-yC_y-Si p-i-n diode structures
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Electroluminescence study of Si-Si_1-x/Si_1-yC_y-Si p-i-n diode structures

机译:SI-SI_1-X / SI_1-YC_Y-SI P-I-N二极管结构的电致发光研究

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摘要

The electroluminescence from p-i-n diode structures with Si_1-yC_y/Si_1-xGe_x layers in the depletion region has been studied. Emission attributed to an overlap of the wavefunction associated with electrons confined in the Si_1-xC_y layer and the wavefunction associated with holes confined in the Si_1-xGe_x layer has been observed. For low injection currents, emission due to recombination occurring in the Si_1-xGe_x layer is more dominant. For structures with higher C concentration, the interface related emission can persist up to higher temperatures.
机译:研究了来自耗尽区域中的Si_1-YC_Y / SI_1-XGE_X层的P-I-N二极管结构的电致发光。归因于与在Si_1-XC_Y层内限制的电子局部相关联的波形的重叠的发射,并且已经观察到与在Si_1-Xge_x层中限制在Si_1-XGE_X层中的孔相关联的波段。对于低进入电流,Si_1-Xge_x层中发生的重组引起的发射更大。对于C浓度较高的结构,界面相关发射可以持续到更高的温度。

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