首页> 外文会议>Symposium on Gate Stack and Silicide Issues in Silicon Processing II, Apr 17-19, 2001, San Francisco, California >Preliminary First Principles Study Of Hf and Zr Aluminates as Replacement High-k Dielectrics
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Preliminary First Principles Study Of Hf and Zr Aluminates as Replacement High-k Dielectrics

机译:Hf和Zr铝酸盐作为替代高k电介质的初步原理研究

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Bulk Density Functional Theory calculations were performed on Hf and Zr substitutions for Al in K-alumina. The lowest energy configuration found was an octahedrally coordinated Zr site. Zr dissolution was favorable with an enthalpy of -2eV/unit cell for forming Al_(1.875)Zr_(0.125)O_3 from pure Zr and K-alumina. Hf and Zr substitution for Al atoms introduced empty d-states below the conduction band edge reducing the E_g of pure K-alumina (7.5eV) to 6.4-5.9eV. The edge of the valence band however remained fixed by the O p-state character. The substitution of Hf and Zr into the alumina structure may lead to a higher dielectric constant, but will also reduce E_g and result in a trade off in tunneling currents in devices.
机译:体积密度泛函理论计算是针对K-氧化铝中Al的Hf和Zr替代进行的。发现的最低能量构型是八面体协调的Zr部位。 Zr的溶解是有利的,其焓为-2eV /晶胞,可以由纯Zr和K-氧化铝形成Al_(1.875)Zr_(0.125)O_3。 Al原子的Hf和Zr取代在导带边缘以下引入了空d态,从而将纯K-氧化铝(7.5eV)的E_g降低至6.4-5.9eV。然而,价带的边缘通过OP状态字符保持固定。将Hf和Zr替换为氧化铝结构可能会导致较高的介电常数,但也会降低E_g并导致器件中隧穿电流的折衷。

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