首页> 外文会议>Symposium on Amorphous and Heterogeneous Silicon-Based Films―2002, Apr 2-5, 2002, San Francisco, California >Light-intensity and temperature dependence of trap-dangling bond recombination in hydrogenated microcrystalline silicon
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Light-intensity and temperature dependence of trap-dangling bond recombination in hydrogenated microcrystalline silicon

机译:氢化微晶硅中陷阱键结合的光强度和温度依赖性

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摘要

A quantitative study of the trap-dangling bond tunneling recombination in hydrogenated micro-crystalline silicon (μc-Si:H) is presented. The transition coefficients were measured at various light exposures and temperatures between T = 10 K and T = 140 K using time-domain measurements of spin-dependent recombination (TSR). TSR is a new characterization method related to electrically detected magnetic resonance (EDMR). It combines the advantages of pulsed electron spin resonance with that of EDMR. In contrast to previous models, the experimental results can only be interpreted if the interaction between the spins of the trap and the dangling bonds as well as triplet recombination is considered.
机译:提出了对氢化微晶硅(μc-Si:H)中陷阱-悬挂键隧穿重组的定量研究。使用自旋依赖性重组(TSR)的时域测量,在T = 10 K和T = 140 K之间的各种曝光和温度下测量了跃迁系数。 TSR是与电检测磁共振(EDMR)相关的一种新的表征方法。它结合了脉冲电子自旋共振和EDMR的优点。与以前的模型相比,只有考虑阱的自旋和悬挂键之间的相互作用以及三重态重组,才能解释实验结果。

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