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Magnetism of Cobalt Base Artificial Lattice Films

机译:钴基人工晶格薄膜的磁性

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The Co/Pd and Co/Pd artificial lattice films have attracted much interest by their special magnetization properties. We discussed the effect of the Pt, Pd layer thickness on the magnetic anisotropy, and we showed the effect of the hydrogen ion implantation on the magnetic properties of multi-layered films. The Co/Pt and Co/Pd multi-layered films were formed on Si(111) substrates with molecular beam epitaxy. We did structure analysis, magnetic domain analysis and magnetic properties evaluation with XRD, MFM and VSM, respectively. Among the series of films of 0.4nm Co layer, XRD showed that the film of 1.0nm Pt layer had a highest periodicity and that they had (111) plane orientation completely. The magnetic domain size reduced with the increase of the thickness of Pt layer. We found out that the coercivity decreased linearly as a function of the length of magnetic domain wall in the unit area. The result of VSM showed that the multi-layered films of Pt thickness of less than 2.8nm had perpendicular magnetic anisotropy. The perpendicular anisotropy energy changed by the nonmagnetic layer thickness and had a maximum value for 0.4nm Co 0.4nm/ nonmagnetic metal l.Onm multi-layered film. After hydrogen implantation into the films, XRD showed that the lattice spacing was swelled with hydrogen dose. Also, MFM observed that the magnetic domain size reduced with the increase of the hydrogen dose. The easy axis of magnetization changed from perpendicular to parallel in the plane with the increase of the hydrogen dose. After evacuation of hydrogen at 473K, perpendicular anisotropy was partially recovered. This phenomenon suggested that the origin of magnetic anisotropy was mainly the lattice mismatch and distortion in the layer interface. But Co/Pd film was not recovered by this thermal treatment. This means that Pd made stable hydride and did not evacuate hydrogen at this temperature.
机译:Co / Pd和Co / Pd人造晶格薄膜因其特殊的磁化性能而引起了人们的极大兴趣。我们讨论了Pt,Pd层厚度对磁各向异性的影响,并展示了氢离子注入对多层膜磁性能的影响。 Co / Pt和Co / Pd多层膜是通过分子束外延在Si(111)衬底上形成的。我们分别使用XRD,MFM和VSM进行了结构分析,磁畴分析和磁性能评估。在0.4nm Co层的一系列膜中,XRD表明1.0nm Pt层的膜具有最高的周期性,并且它们完全具有(111)面取向。随着Pt层厚度的增加,磁畴尺寸减小。我们发现矫顽力随单位面积中磁畴壁的长度呈线性下降。 VSM的结果表明,Pt厚度小于2.8nm的多层膜具有垂直的磁各向异性。垂直各向异性能随非磁性层的厚度而变化,并且对于0.4nm Co 0.4nm /非磁性金属l.Onm多层膜具有最大值。氢注入薄膜后,XRD表明晶格间距随着氢剂量的增加而膨胀。此外,MFM观察到磁畴尺寸随氢剂量的增加而减小。随着氢剂量的增加,易磁化轴在平面中从垂直方向变为平行方向。在473K下抽空氢气后,部分恢复了垂直各向异性。这种现象表明,磁各向异性的起源主要是层界面的晶格失配和畸变。但是,该热处理不能回收Co / Pd膜。这意味着Pd生成稳定的氢化物,并且在此温度下不排空氢气。

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