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Magnetism of cobalt base artificial lattice films

机译:钴基人造晶格薄膜的磁性

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The Co/Pd and Co/Pd artificial lattice films have attracted much interest by their special magnetization properties. We discussed the effect of the Pt, Pd layer thickness on the magnetic anisotropy, and we showed the effect of the hydrogen ion implantation on the magnetic properties of multi-layered films. The Co/Pt and Co/Pd multi-layered films were formed on Si(111) substrates with molecular beam epitaxy. We did structure analysis, magnetic domain analysis and magnetic properties evaluation with XRD, MFM and VSM, respectively. Among the series of films of 0.4nm Co layer, XRD showed that the film of 1.0nm Pt layer had a highest periodicity and that they had (111) plane orientation completely. The magnetic domain size reduced with the increase of the thickness of Pt layer. We found out that the coercivity decreased linearly as a function of the length of magnetic domain wall in the unit area. The result of VSM showed that the multi-layered films of Pt thickness of less than 2.8nm had perpendicular magnetic anisotropy. The perpendicular anisotropy energy changed by the nonmagnetic layer thickness and had a maximum value for 0.4nm Co 0.4nm/nonmagneric metal 1.0nm multi-layered film. After hydrogen implantation into the films, XRD showed that the lattice spacing was swelled with hydrogen dose. Also, MFM observed that the magnetic domain size reduced with the increase of the hydrogen dose. The easy axis of magnetization changed from perpendicular to parallel in the plane with the increase of the hydrogen dose. After evacuation of hydrogen at 473K, perpendicular anisotropy was partially recovered. This phenomenon suggested that the origin of magnetic anisotropy was mainly the lattice mismatch and distortion in the layer interface. But Co/Pd film was not recovered by this thermal treatment. This means that Pd made stable hydride and did not evacuate hydrogen at this temperature.
机译:CO / Pd和Co / Pd人造晶格薄膜通过其特殊的磁化性能引起了很多兴趣。我们讨论了Pt,Pd层厚度对磁各向异性的影响,并且我们展示了氢离子注入对多层薄膜磁性的影响。在具有分子束外延的Si(111)衬底上形成Co / Pt和Co / Pd多层膜。我们分别使用XRD,MFM和VSM进行结构分析,磁域分析和磁性评估。在0.4nm Co层的一系列膜中,XRD表示1.0nM Pt层的膜具有最高的周期性,并且它们完全具有(111)平面取向。随着PT层的厚度的增加,磁畴尺寸减小。我们发现矫顽力随着单元区域中的磁畴壁的长度而线性地线性降低。 VSM的结果表明,PT厚度小于2.8nm的多层薄膜具有垂直磁各向异性。通过非磁性层厚度改变的垂直各向异性能量,并且具有0.4nm CO 0.4nm /非显着的金属1.0nm多层膜的最大值。在氢气注入到薄膜之后,XRD表示用氢剂量溶胀晶格间距。而且,MFM观察到磁畴尺寸随着氢剂量的增加而降低。随着氢剂量的增加,容易磁化磁化轴从垂直于平面中的平行变为平行。在473K在473K氢气排出后,部分回收垂直各向异性。这种现象表明,磁各向异性的起源主要是层界面的晶格失配和变形。但是这种热处理没有恢复CO / Pd薄膜。这意味着PD制成稳定的氢化物,在该温度下没有抽出氢。

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