首页> 外文会议>State-of-the-Art Program on Compound Semiconductors 49(SOTAPOCS 49) -and- Nitrides and Wide-Bandgap Semiconductors for Sensors, Photonics, and Electronics 9 >Effect of the silver mirror location on the luminance intensity of double roughened GaN light-emitting diodes
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Effect of the silver mirror location on the luminance intensity of double roughened GaN light-emitting diodes

机译:银镜位置对双粗糙GaN发光二极管亮度强度的影响

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摘要

A new scheme structure of ITO/Ni/Ag/Ni mirror was presented to get high reflectance after annealing. At 470nm, the reflectance was as high as 90% after annealing at 270℃ for 1 hour.
机译:提出了一种新的ITO / Ni / Ag / Ni镜面结构,以提高退火后的反射率。在470nm下,在270℃下退火1小时,反射率高达90%。

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