A FEASIBILITY STUDY FOR sub-100 nm POLYMER INJECTION MOLDING

摘要

In this work, silicon mold manufacturing is considered to evaluate polymer replication at the nanoscale. The molds are made via e-beam lithography and deep reactive ion etching. Amorphous cyclic olefin copolymer is processed with optimized molding conditions. Characterization of the molds and replicas is carried out with atomic-force and scanning-electron microscopy. We find that the dose exposure is a critical parameter to observe for proper exposure of the mask and that low surface energy plasma polymerized films can be utilized as anti-adhesion layer during injection microano-molding. We have fabricated structured molds and replicated features as small as SS nm. We also demonstrate that the resolution of injection molded COC products is at least 5nm.