首页> 外文会议>Sixth International Symposium on Diamond Materials, 6th, Oct 17-22, 1999, Honolulu, Hawaii >Microstructures in Diamond for 'DMEMS', Diamond Micro Electromechanical Systems
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Microstructures in Diamond for 'DMEMS', Diamond Micro Electromechanical Systems

机译:金刚石微机电系统“ DMEMS”的金刚石微结构

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摘要

The rapidly developing technology for forming MEMS (micro electromechanical structures) has lead to very dimensionally and electrically robust microstructures in silicon. Interestingly, many of these forms are also achievable in diamond films. Furthermore, micron dimensioned microlithography and etching techniques have been applied to diamond films to create, for example: Piezoresistors, Microtips, Pressure membranes/ micro windows, and Gated VFETs. This paper will describe the diamond microstructures of such microelements. It has been previously substantiated that diamond films could be processed similar to conventional semiconductor films such as silicon and gallium arsenide. In this paper we describe aspects to achieving a monolithic diamond resistor. The delineated diamond resistors are electrically characterized. Other diamond microelements are also considered.
机译:迅速发展的用于形成MEMS(微机电结构)的技术已导致硅中尺寸和电气性能非常稳定的微结构。有趣的是,这些形式中的许多形式在金刚石薄膜中也是可以实现的。此外,微米尺寸的微光刻和蚀刻技术已应用于金刚石膜,以产生例如:压敏电阻,微尖端,压力膜/微窗口和门控VFET。本文将描述这种微量元素的金刚石微结构。先前已经证实,可以类似于常规半导体膜例如硅和砷化镓来处理金刚石膜。在本文中,我们描述了实现单片金刚石电阻器的各个方面。所描绘的菱形电阻器具有电气特性。还考虑了其​​他金刚石微量元素。

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