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n-TYPE DOPING OF DIAMOND BY ION-IMPLANTED GROUP VI ATOMS

机译:离子注入VI族原子对金刚石的n型掺杂

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摘要

Nitrogen forms deep donor centers at≈1.7 eV below the conduction band of diamond. Recently, phosphorus donors have been activated in diamond. Although shallower, they still have an ionization energy E_D≈0.6 eV. In this study, it is demonstrated that shallower donors can be activated in diamond by means of the cold-implantation-rapid-annealing (CIRA) routine, when using either oxygen or sulfur ions. The key is to employ a relatively low temperature for the rapid annealing step. One reason for this requirement is diamond's negative electron affinity (NEA). The conduction band is situated at≈0.5 eV above the vacuum level. This indicates that shallow donor centers (with E_D < 0.5 eV) will be high energy (metastable) states. Such states, if they can be created, should tend to relax into deeper lying states at high annealing temperatures. Low annealing temperatures are thus needed to "quench" them into these higher energy configurations.
机译:氮在金刚石的导带下方约1.7 eV处形成深施主中心。最近,磷供体已经在金刚石中活化。尽管更浅,但它们仍具有电离能E_D≈0.6eV。在这项研究中,证明了当使用氧或硫离子时,可以通过冷注入-快速退火(CIRA)程序激活金刚石中的较浅供体。关键是在快速退火步骤中采用相对较低的温度。产生此要求的原因之一是钻石的负电子亲和力(NEA)。导带位于真空水平之上约0.5 eV。这表明浅的供体中心(E_D <0.5 eV)将处于高能(可稳态)状态。如果可以建立这样的状态,则应在高退火温度下趋向于放松到更深的状态。因此需要低的退火温度以将它们“淬火”为这些较高能量的构型。

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