首页> 外文会议>Simulation of semiconductor processes and devices 1998(SISPAD98) >Statistical Modeling based on extensive TCAD simulations Proposed methodology for extraction of Fast/Slow models and Statistical models
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Statistical Modeling based on extensive TCAD simulations Proposed methodology for extraction of Fast/Slow models and Statistical models

机译:基于大量TCAD模拟的统计建模提出的用于提取快速/慢速模型和统计模型的方法

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摘要

Determination of fast/slow models and/or statistical models as a function of process dispersions are very challenging for designing new circuits. The present paper describes a methodology to extract fast/slow models and statistical models based on extensive process/device simulation. Also, AC parameters are extracted such as drain to gate overlap capacitance of MOS transistors as a function of process parameters variations. With the help of Principle Component Analysis, it is possible to get an uncorrelated set of parameter that represent electrical and SPICE parameters dispersions. This leads to a more easy analysis for providing statistical models.
机译:根据工艺离散性确定快速/慢速模型和/或统计模型对于设计新电路非常具有挑战性。本文介绍了一种基于广泛的过程/设备仿真来提取快速/慢速模型和统计模型的方法。而且,根据工艺参数变化提取AC参数,例如MOS晶体管的漏极至栅极的重叠电容。借助主成分分析,可以获得一组不相关的参数,这些参数代表电和SPICE参数的色散。这使得提供统计模型的分析更加容易。

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