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Very large photogain and high photorespone linearity of Ge-dot photoMOSFETs operating in accumulation-mode for monolithic Si photonics

机译:用于单片Si光子的以累积模式工作的Ge-dot光MOSFET的非常大的光增益和高光敏线性度

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We experimentally demonstrated that the inclusion of Ge dots into the gate stack of a Si MOSFET provides extremely high photoresponsivity over 1,000A/W and superior photoresponse linearity of at least 7 decades for 400-1300nm illumination, depending on whether the Ge-dot photoMOSFET operates in the inversion or accumulation modes. Remarkably a very large photocurrent gain of 10
机译:我们通过实验证明,在Si MOSFET的栅极叠层中包含Ge点可提供超过1,000A / W的极高光响应性,并且对于400-1300nm照明,其光响应线性度至少为7十年,这取决于Ge点光电MOSFET是否工作在反转或累加模式下。光电流增益非常大,为10

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