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High-gain new InGaAsN heterostructure

机译:高增益新型InGaAsN异质结构

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Beryllium incorporation in InGaAsN quantum well improves the optical properties of this dilute nitride material significantly. After annealing, the intensity of the photoluminescence of this new dilute nitride material (InGaAsNBe) is about 20 times higher and its wavelength is even 25 nm longer. After a certain time of this heat treatment, the photoluminescence quenched slowly for InGaAsN structures because of the strain relaxation due to the thermal activation. The photoluminescence of InGaAsNBe increased rapidly and show no saturation even after a very long time of annealing. Beryllium incorporation in InGaAs which was grew at the same temperature as dilute nitrides also improves the optic properties. But the improvement for InGaAsNBe is 10 times more than for InGaAsBe. Laser processing based on the new InGaAsNBe structures resulted in one half of the threshold current density compare to conventional InGaAsN.
机译:在InGaAsN量子阱中掺入铍会大大改善这种稀氮化物材料的光学性能。退火后,这种新型稀氮化物材料(InGaAsNBe)的光致发光强度大约高20倍,其波长甚至长25 nm。经过一定时间的热处理后,由于InGaAsN结构的热活化引起的应变松弛,其光致发光缓慢淬灭。 InGaAsNBe的光致发光迅速增加,即使经过很长时间的退火也没有饱和。在与稀氮化物相同的温度下生长的InGaAs中掺入铍也改善了光学性能。但是InGaAsNBe的改进是InGaAsBe的10倍以上。与传统的InGaAsN相比,基于新型InGaAsNBe结构的激光加工可将阈值电流密度降低一半。

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