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Charge transport in InN nanowires investigated by scanning probe microscopy

机译:通过扫描探针显微镜研究InN纳米线中的电荷传输

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Over the past decade there has been an increasing interest in developing nanoscale nitride devices with enhanced functionalities and much improved performance compared to traditional devices [1]. In the past few years, InN materials have drawn high research interest following discovery of their surprisingly low bandgap (0.7–0.9 eV), high carrier mobility, and surface electron accumulation. Considerable recent research interest has also been focused toward synthesizing InN NWs and exploiting their unique material properties to develop novel multifunctional devices. In spite of their promise, there are only a few reports on the synthesis and characterization of InN NWs, partly due to the difficulty in achieving good material quality. Recently, Cai et al. reported on the synthesis of high quality InN nanowires (NWs) with uniform diameter and good crystalline properties [2]. However, unique surface electronic properties of these NWs are not yet fully understood, since direct experimental evidences are lacking so far.
机译:在过去的十年中,与传统设备相比,人们对开发具有增强的功能和性能大大提高的纳米级氮化物设备的兴趣日益增加[1]。在过去的几年中,InN材料因其带隙低(0.7-0.9 eV),高载流子迁移率和表面电子积累而出人意料,引起了高度的研究兴趣。近来相当多的研究兴趣也集中在合成InN NW并利用其独特的材料特性来开发新颖的多功能设备。尽管有希望,但关于InN NW合成与表征的报道很少,部分原因是难以获得良好的材料质量。最近,蔡等人。报道了具有均匀直径和良好结晶特性的高质量InN纳米线(NWs)的合成[2]。但是,由于到目前为止尚缺乏直接的实验证据,因此尚未充分了解这些NW的独特表面电子性质。

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