首页> 外文会议>ROMOPTO 2003: Seventh Conference on Optics >Pt, Pd, Ni METALLIC THIN FILMS DEPOSITED BY PULSED LASER ABLATION
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Pt, Pd, Ni METALLIC THIN FILMS DEPOSITED BY PULSED LASER ABLATION

机译:脉冲激光烧蚀沉积的Pt,Pd,Ni金属薄膜

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We have investigated thin films of Ni, Pt, Pd, Ni-Pt and Ni-Pd deposited by pulsed laser ablation. Our study was focused on the correlation of layer morphology and composition vs. synthesis parameters (material, laser fluence and wavelength). In order to obtain bimetallic films we alternatively irradiated two different metal targets. A Nd:YAG laser (λ = 355 and 532 nm, 5 ns pulse duration, fluence 15-30 J/cm~2) was used. Film analysis was made by AFM and RBS. The synthesized layers had a roughness (Ra) between 15 and 40 mm for Pt and Pd and between 80 and 120 nm for Ni. The rate deposition was in the range of 0.04-0.8 A. In the composite layers, in condition of equally radiated targets, the Ni/Pd at. concentration was 50/50%, while for the Ni/Pt layer was 30/70 %.
机译:我们研究了通过脉冲激光烧蚀沉积的Ni,Pt,Pd,Ni-Pt和Ni-Pd薄膜。我们的研究集中在层形态和组成与合成参数(材料,激光通量和波长)的相关性上。为了获得双金属膜,我们交替照射了两个不同的金属靶。使用了Nd:YAG激光器(λ= 355和532 nm,脉冲持续时间为5 ns,通量为15-30 J / cm〜2)。电影分析由AFM和RBS进行。对于Pt和Pd,合成层的粗糙度(Ra)为15至40mm,对于Ni,粗糙度为80至120nm。沉积速率在0.04-0.8 A的范围内。在复合层中,在靶材均等辐射的条件下,Ni / Pd为。 Ni / Pt层的浓度为50/50%,而Ni / Pt层的浓度为30/70%。

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