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Pt, Pd, Ni metallic thin films deposited by pulsed laser ablation

机译:Pt,Pd,Ni金属薄膜被脉冲激光烧蚀沉积

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We have investigated thin films of Ni, Pt, Pd, Ni-Pt and Ni-Pd deposited by pulsed laser ablation. Our study was focused on the correlation of layer morphology and composition vs. synthesis parameters (material, laser fluence and wavelength). In order to obtain bimetallic films we alternatively irradiated two different metal targets. A Nd:YAG laser (λ = 355 and 532 nm, 5 ns pulse duration, fluence 15-30 J/cm~2) was used. Film analysis was made by AFM and RBS. The synthesized layers had a roughness (Ra) between 15 and 40 nm for Pt and Pd and between 80 and 120 nm for Ni. The rate deposition was in the range of 0.04-0.8 A. In the composite layers, in condition of equally radiated targets, the Ni/Pd at. concentration was 50/50%, while for the Ni/Pt layer was 30/70%.
机译:我们已经研究了通过脉冲激光烧蚀沉积的Ni,Pt,Pd,Ni-Pt和Ni-Pd的薄膜。我们的研究专注于层形态和组成与合成参数的相关性与合成参数(材料,激光器流量和波长)的相关性。为了获得双金属薄膜,我们替代地照射了两种不同的金属靶标。使用Nd:YAG激光(λ= 355和532nm,5 ns脉冲持续时间,注射15-30J / cm〜2)。薄膜分析由AFM和RBS制成。合成层的粗糙度(Ra)在15至40nm之间,对于Pt和Pd,对于Ni的80至120nm。速率沉积在0.04-0.8a的范围内。在复合层中,在同等辐射的靶标的条件下,Ni / Pd在。浓度为50/50%,而Ni / Pt层为30/70%。

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