Novel combined low-coherence interferometry spectrally resolved reflectometry compatible with high-resolution Raman spectroscopy for nondestructive characterization of MEMS structures

摘要

We presented novel tool employing both low coherence interferometer, and spectrally resolved reflectometer sensor. We discuss compatibility of this metrology with high resolution Raman spectroscopy. We present measurements of the stability of the Raman spectrometer indicating that system is capable to measure stress in silicon with reproducibility corresponding to 1 MPa and below. We propose integrated tool for simultaneous measurement of stress and displacement of the micro-machined electromechanical devices. Furthermore we propose Raman system configuration allowing measurement of all independent stress tensor components on submicron scale.