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Investigation of post-annealing indium tin oxide for future electro-optical device application

机译:后退火铟锡氧化物在未来光电器件中的研究

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The nanostructure transformation associated with electro-optical properties via post-annealing of indium tin oxide film (ITO) is investigated by increasing post-annealing temperature in ambient oxygen. Although oxygen vacancy and activation Sn ions contribute to conductivity of ITO film, the oxygen vacancy inevitably reduces during posting annealing, but Sn-O related bonds are oppositely increased with IR absorption at 790 cm~(-1). Moreover, the sheet resistance of as-deposited ITO film 8.6 fl/sq increases to 47 Ω/sq as the annealing temperature rises to 500℃, the photoluminescence (PL) spectrum indicates that the oxygen vacancy plays a key role in dominating R_s in comparison with Sn-O bonds. The blue light transmittance of ITO film is slightly proportional to the annealing temperature due to phase crystallization enhancing band gap narrowing. Furthermore, as the annealing temperature rises beyond 500℃, the transmittance is compromised between the Burstein-Moss effect of high carrier concentration and nanostructure crystallinity. The oxygen deficient vacancy, instead of Sn-O related bonds, is a major contribution for ITO conductivity and transmittance
机译:通过提高环境氧气中的退火后温度,研究了通过铟锡氧化物薄膜(ITO)的退火后与电光性能相关的纳米结构转变。尽管氧空位和活化Sn离子有助于ITO膜的导电性,但氧空位在后期退火过程中不可避免地降低,但是Sn-O相关键却在790 cm〜(-1)处被IR吸收相反地增加。此外,随着退火温度升高到500℃,沉积后的ITO膜的薄膜电阻8.6 fl / sq增加到47Ω/ sq,光致发光(PL)光谱表明,氧空位在控制R_s方面起着关键作用。与锡-氧键。由于相结晶增强带隙变窄,ITO膜的蓝光透射率与退火温度略成比例。此外,当退火温度超过500℃时,高载流子浓度的Burstein-Moss效应和纳米结构结晶度之间的透射率受到影响。缺氧空位而不是Sn-O相关键是ITO电导率和透射率的主要贡献

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