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Pulse photoluminescence of proous 6H-SiC films

机译:6H-SiC薄膜的脉冲光致发光

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摘要

Photoluminescence from porous 6H-SiC films was studied. The porous films were obtained by electrochemical anodization of (0001)-oriented n-type conduction 6H-SiC wafers in HF-ethanol sol9ution. The photoluminescence spectra are measured with excitation by CW-radiation of Ar_2 laser and pulsed radiation of N_2 laser at the temperatures 80 and 300 K. The photoluminescence intensity of porous films was in 20 times as large as in the as-grown single crystals. The photoluminescence spectra of porous films are formed at least by three bands with the peak energies about 2.2, 2.6 and 2.8 eV. We can not confirm at present time the principal change in the light emission mechanisms of SiC after its electrochemical etching.
机译:研究了多孔6H-SiC薄膜的光致发光。通过在HF-乙醇溶液中对(0001)取向的n型导电6H-SiC晶片进行电化学阳极氧化获得多孔膜。通过在80和300 K的温度下通过Ar_2激光的CW辐射和N_2激光的脉冲辐射进行激发来测量光致发光光谱。多孔膜的光致发光强度是生长的单晶的20倍。多孔膜的光致发光光谱至少由三个带形成,其峰值能量约为2.2、2.6和2.8eV。目前尚无法确定电化学蚀刻后SiC发光机理的主要变化。

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