首页> 外文会议>Proceedings of 8th Sino-Japanese Joint Meeting on Optical Fibre Science and Electromagnetic Theory : OFSET'2003-2004 >The Sensitive Properties Analysis of magnetron sputtering Oxide Vanadium Thin Films
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The Sensitive Properties Analysis of magnetron sputtering Oxide Vanadium Thin Films

机译:磁控溅射氧化钒薄膜的敏感特性分析

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摘要

In this paper, the thermal sensitive of Vanadium oxides thin films was analyzed. The vanadium oxide thin films are made by magnetron sputtering method under low substrate temperature. It is analyzed that the composition varies of vanadium oxide effects on the TCR and resistance of the thin films. In experimental, it is analyzed that the resistance of thin film varies with temperature. The composition of vanadium oxide thin film has been discussed by X ray photoelectric spectrum analysis. The effect of process condition on the composition of vanadium oxide thin films is analyzed also.
机译:本文分析了氧化钒薄膜的热敏性。氧化钒薄膜是通过磁控溅射法在低基板温度下制成的。据分析,钒氧化物的组成变化对TCR和薄膜电阻的影响。在实验中,分析了薄膜的电阻随温度变化。已经通过X射线光电光谱分析讨论了氧化钒薄膜的组成。还分析了工艺条件对钒氧化物薄膜组成的影响。

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