METHOD FOR MANUFACTURING HIGH-PURITY VANADIUM, HIGH- PURITY VANADIUM, SPUTTERING TARGET COMPOSED OF THE HIGH- PURITY VANADIUM, AND THIN FILM DEPOSITED USING THE SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently manufacturing high-purity vanadium from vanadium raw material (vanadium oxide) containing iron, aluminum, silicon, carbon, oxygen, etc., in large quantities and to provide a technology for efficiently manufacturing high-purity vanadium of =4 N (99.99 wt.%) purity from the raw material. SOLUTION: The high-purity vanadium can be manufactured by: subjecting crude vanadium raw material composed of vanadium oxide to acid leaching to prepare vanadium solution; adding alkaline solution to it to carry out pH adjustment; adding ammonium chloride to precipitate high-purity ammonium vanadate; roasting the resultant high-purity ammonium vanadate precipitate to obtain high-purity vanadium oxide; and reducing the high-purity vanadium oxide to form the high-purity vanadium.