Organic and inorganic resists for recording of combined optical/digital security devices

摘要

In the present paper the comparative analysis of organic and inorganic resists for registration of optical/digital holograms is described. The purpose of researches - to find optimum recording medium for record of the combined holographic protective elements. Organic photoresist S1800~®, organic PMMA electron-resist and inorganic resist -Chalcogenide Glass System (HGS) As_(40)S_(60-x)Se_x (where x=20,30,40) were investigated. Besides this, information characteristics resist layers of HGS were investigated with the purpose of definition optimal recording modes of optical microstructures by Electron Beam Printing System (EBPS). The correcting method of system response on forming of interactive diffraction grating is offered. It is shown, that maximal electron sensitivity have resist layers As_(40)S_(40)Se_(20). It was revealed during researches, that for this task an organic resist S1800~® series and inorganic - As_(40)S_(40)Se_(20) are suitable. On results of our measurements it has been established that organic resist S1800~® is more sensitive (more than 10 times) in comparsion with HGS and provides higher resolution (about 2500 lines per millimeter). Providing of high resolution is very important for registering Computer Generated Holograms (CGH), especially 3-D images holograms.