首页> 外文会议>Power Semiconductor Devices amp; IC's, 2005 IEEE International Symposium on; Lake Buena Vista,FL,USA >Stress measurement by X-Ray diffraction method for electrodeposited SnCu coating on alloy 42 substrate
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Stress measurement by X-Ray diffraction method for electrodeposited SnCu coating on alloy 42 substrate

机译:X射线衍射法测量合金42基体上电沉积SnCu涂层的应力

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摘要

A stress measurement method using SnCu coating on an Alloy 42 substrate sample, which indicated non-linear sin Psi diagram for the coating under ordinary X-ray diffraction conditions was investigated. Diffraction profile versus 2thetas diagram
机译:研究了在合金42基体样品上使用SnCu涂层的应力测量方法,该方法表明了在普通X射线衍射条件下涂层的非线性sin Psi图。衍射曲线与2θ图

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