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Design considerations for InGaAlP lasers and light–emitting diodes on high–index GaAs substrates for the yellow and green spectral range

机译:黄色和绿色光谱范围内高折射率GaAs衬底上的InGaAlP激光器和发光二极管的设计注意事项

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We consider the impact of strain and substrate orientation on the conduction band (CB) and valence band (VB) energiesin (Al,Ga,In)P materials. We show that applying tensile strained GaP–rich insertions as barriers in lattice–matchedheterostructures grown on high–index GaAs substrates, like (211), (322), and (111) ones, allows to overcome the mainproblem of (Al,Ga,In)P materials, namely the cross–over of the Γ and X minima of the CB in (In,Ga,Al)P alloy at ~55%AlInP content which hinders the possibility to extend the spectral range of the devices towards shorter wavelengths.Adding GaP–enriched insertion for structures grown on the (111) substrate allows to shift the X minimum upwardsforming a potential barrier for electrons escaping the active region. Both the initial energy of the CB X minimum of GaP,the highest among Ⅲ–Ⅴ binaries, and the tensile strain help. For other orientations the effect is reduced or is even ofopposite sign due to the splitting of the X band minimum upon applied strain. For high strain an impact on the Γ and Lminima in the barrier insertion are to be considered, as both minima are strongly shifted downwards once the strainedinsertion is parallel to the (111) plane. Admixture of AlP helps to push the Γ and L minima to higher energies (additional1 eV for L minimum for AlP compared to GaP) even at the expense of a smaller increase of the X band–induced barrier.Experimental results confirm the predictions, revealing lasing at 599 nm at room temperature. We show that with propersubstrate orientation and the composition of the strained barriers one can strongly modify and tune the CB minimaextending the spectral rage of InGaAlP lasers to wavelengths shorter than ~570–590 nm at room temperature.
机译:我们考虑应变和衬底取向对导带(CB)和价带(VB)能量\ r \ nin(Al,Ga,In)P材料的影响。我们表明,在高折射率GaAs衬底(例如(211),(322)和(111))衬底上生长的晶格匹配\ r \ n异质结构中,应用拉伸应变的富含GaP的插入物作为势垒,可以克服主要问题。 \ n(Al,Ga,In)P材料的问题,即(In,Ga,Al)P合金中CB的Γ和X最小值在〜55%处的交叉\ r \ nAlInP含量阻碍了这种可能性\ r \ n为在(111)衬底上生长的结构增加GaP富集的插入可以使X最小值向上移动\ r \ n形成电子逃逸到有源区的势垒。 GaP的CB X最小值的初始能量,\ r \ n在Ⅲ–Ⅴ类二元化合物中最高,并且拉伸应变都有帮助。对于其他方向,由于在施加应变时X谱带最小值的分裂,效果降低或什至为\ n \ nopositive sign。对于高应变,应考虑对势垒插入过程中的Γ和L \ r \ nminima的影响,因为一旦应变\ r \ n插入平行于(111)平面,这两个最小值就会强烈向下移动。 AlP的混合有助于将Γ和L的最小值推至更高的能量(与GaP相比,AlP的L最小值为\ r \ n1 eV的附加值),即使以较小的X谱带诱导的势垒增加为代价。\ r \ n实验性结果证实了这一预测,揭示了室温下599 nm的激光发射。我们表明,通过正确的\ r \ n基体取向和应变屏障的组成,可以在室温下强烈地修改和调谐CB最小值,从而将InGaAlP激光器的光谱范围扩展到短于570〜590 nm的波长。

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  • 来源
    《Novel In-Plane Semiconductor Lasers XVIII》|2019年|109390K.1-109390K.12|共12页
  • 会议地点 0277-786X;1996-756X
  • 作者单位

    VI Systems GmbH, Hardenbergstr. 7, Berlin D–10623, Germany;

    VI Systems GmbH, Hardenbergstr. 7, Berlin D–10623, Germany;

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  • 正文语种 eng
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