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Strong coupling in a single quantum dot semiconductor microcavity system

机译:单量子点半导体微腔系统中的强耦合

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Properties of atom-like emitters in cavities are successfully described by cavity quantum electrodynamics (cQED). We report on cavity quantum electrodynamics (cQED) experiments in a single quantum dot semiconductor system. CQED, which is a very active research field in optics and solid state physics, can be divided into a weak and a strong coupling regime. In case of weak coupling, the spontaneous emission rate of an atom-like emitter, e.g. a single quantum dot exciton, can be enhanced or reduced compared to the value in vacuum in an irreversible emission process. In contrast, a reversible energy exchange between the emitter and the cavity mode takes place when the conditions for strong coupling are fulfilled. We investigate weak as well as strong coupling in a system based on a low density In_(0.3)Ga_(0.7)As quantum dot layer placed as the active layer in a high quality planar AlAs/GaAs distributed Bragg reflector cavity grown by molecular beam epitaxy. Using electron beam lithography and deep plasma etching, micropillars with high Q-factors (up to 43.000 for 4 μm diameter) were realized from the planar cavity structure. Due to the high oscillator strength of the In_(0.3)Ga_(0.7)As quantum dots together with a small mode volume in high finesse micropillar cavities it is possible to observe strong coupling characterized by a vacuum Rabi splitting of 140 μeV. The fabrication of high-Q micropillar cavities as well as conditions necessary to realize strong coupling in the present system are discussed in detail.
机译:通过腔量子电动力学(cQED)成功地描述了腔中原子状发射体的特性。我们报告了单个量子点半导体系统中的腔量子电动力学(cQED)实验。 CQED是光学和固态物理学中非常活跃的研究领域,可以分为弱耦合机制和强耦合机制。在弱耦合的情况下,原子状发射器的自发发射速率,例如与不可逆发射过程中的真空值相比,单个量子点激子可以提高或降低。相反,当满足强耦合的条件时,在发射器和腔模式之间发生可逆的能量交换。我们研究了基于低密度In_(0.3)Ga_(0.7)As量子点层作为分子层外延生长的高质量平面AlAs / GaAs分布布拉格反射腔中的有源层的系统中的弱耦合和强耦合。使用电子束光刻和等离子深蚀刻,从平面腔结构中获得了具有高Q因子(直径4μm时高达43.000)的微柱。由于In_(0.3)Ga_(0.7)As量子点的高振荡器强度以及高精细微柱腔中的小模式体积,因此可以观察到以140μeV的真空拉比分裂为特征的强耦合。详细讨论了高Q微柱腔的制造以及在本系统中实现强耦合所需的条件。

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