首页> 外文会议>Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE >High rate deposition of microcrystalline silicon with silicon oxide doped layers: Highlighting the competing roles of both intrinsic and extrinsinc defects on the cells performances
【24h】

High rate deposition of microcrystalline silicon with silicon oxide doped layers: Highlighting the competing roles of both intrinsic and extrinsinc defects on the cells performances

机译:具有氧化硅掺杂层的微晶硅的高速率沉积:突出了固有缺陷和外在缺陷对电池性能的竞争作用

获取原文
获取原文并翻译 | 示例

摘要

Hydrogenated microcrystalline silicon (μc-Si:H) has become a material of increasing interest these last years mainly for its use in cost-effective production of tandem and triple junction thin film silicon based solar cells. Lately, the use of novel doped silicon oxide (SiOx) layers were shown to be very promising for increasing the solar cells efficiency [1,2]. We present in this study a detailed analysis on the possible reasons behind this significant increase of electrical performances. Complete solar cells were developed in an industrial type reactor with their intrinsic layer (i-layer) deposited at a high growth rate of 1 nm/s by VHF-PECVD. Different i-layer material quality and substrate roughness were systematically evaluated during this investigation. We demonstrate conversion efficiency increase of up to 29% when both these p-type and n-type doped SiOx layers are used instead of the regular microcrystalline ones, while keeping the bulk of intrinsic material unchanged and efficiencies over 8% are achieved for a wider range of plasma parameters and substrate roughness. Extensive material analysis is presented hereafter to understand the physical origins for the improvements observed. XRD, Raman and FTIR spectroscopy, intrinsic stress, FTPS and SIMS measurements were done along with SEM images of the solar cells. It is found that devices with very different efficiencies can lead to similar FTIR and FTPS spectrum. We show that the integration of doped SiOx layers reduces to some extent the influence of porous regions, i.e. microcracks, on the electrical properties of the solar cells, and the possible physical reasons for this improvement are discussed. The development of these extrinsic defects, not detected by FTPS and FTIR, is becoming especially detrimental on highly textured substrates, required for increased light trapping. This highlights the fundamental nature difference of intrinsic and extrinsic defects which c- n both drive the cells performances.
机译:近年来,氢化微晶硅(μc-Si:H)成为人们越来越感兴趣的材料,主要是因为其可用于具有成本效益的串联和三结薄膜硅基太阳能电池生产中。最近,使用新型掺杂的氧化硅(SiOx)层被证明对于提高太阳能电池效率非常有前途[1,2]。在本研究中,我们对电气性能显着提高背后的可能原因进行了详细分析。完整的太阳能电池是在工业型反应器中开发的,其固有层(i层)通过VHF-PECVD以1 nm / s的高生长速率沉积。在此研究过程中,系统地评估了不同的i层材料质量和基材粗糙度。我们证明当同时使用这些p型和n型掺杂的SiOx层代替常规的微晶层时,转换效率提高高达29%,同时保持本征材料的大部分不变,并且更宽的效率达到8%以上等离子体参数范围和基材粗糙度。此后将进行广泛的材料分析,以了解所观察到的改进的物理原因。 XRD,拉曼光谱和FTIR光谱,固有应力,FTPS和SIMS测量以及太阳能电池的SEM图像均已完成。发现效率差异很大的设备会导致相似的FTIR和FTPS频谱。我们表明,掺杂的SiO x层的集成在一定程度上减少了多孔区域即微裂纹对太阳能电池的电性能的影响,并讨论了这种改进的可能的物理原因。 FTPS和FTIR无法检测到的这些外在缺陷的发展,在增加光捕获所需的高度纹理化的基材上变得尤其有害。这凸显了内在缺陷和外在缺陷的根本性质差异,它们都影响着电池性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号