Effect of deposition conditions on the stoichiometry and structural properties of LiNbO_3 thin films deposited by MOCVD

摘要

Epitaxial LiNbO_3 thin films were deposited on C-sapphire substrates by pulsed injection metal organic chemical vapor deposition and atmospheric pressure metal organic chemical vapor deposition. The effect of deposition conditions, such as the ratio of Li/Nb precursors in solution and the deposition pressure, on the phase composition, Li nonstoichiometry, texture, epitaxial quality, residual stresses and formation of twins in LiNbO_3 films was studied by means of X-ray diffraction and Raman spectroscopy. It was found that the deposition pressure played an important role in the incorporation of Li_2O in the film and the formation of in-plane and out-of-plane twins.