首页> 外文期刊>Journal of materials science >Influence of deposition conditions on structural, electrical, and optical properties of cadmium oxide thin films deposited using the spray pyrolysis technique
【24h】

Influence of deposition conditions on structural, electrical, and optical properties of cadmium oxide thin films deposited using the spray pyrolysis technique

机译:沉积条件对使用喷雾热解技术沉积的氧化镉薄膜结构,电和光学性质的影响

获取原文
获取原文并翻译 | 示例
           

摘要

In this study, thin films of cadmium oxide (CdO) were deposited on soda-lime glass substrates using the simple spray pyrolysis technique using a cadmium acetate precursor. The results regarding the structural, electrical, and optical properties of the layers as a function of the substrate temperature ranging from 280 to 340 °C, spray rate ranging from 5 to 20 ml/min, and volume of solution ranging from 50 to 125 ml were systematically studied. The X-ray diffraction (XRD) analysis revealed that all the thin films had a polycrystalline nature with the fcc structure of single-phase CdO. The analysis also showed peaks related to (111), (200), (220), and (311) planes. The field emission scanning electron microscopy (FE-SEM) images showed that the morphology surface of the thin films was spherical. The atomic force microscopy (AFM) analysis demonstrated that the roughness of thin films ranged from 21.16 to 60.9 nm. The Hall effect and thermoelectric studies revealed that the films exhibited an n-type conductivity. The Hall effect measurement study also showed that the carrier concentration (n) and carrier mobility were of the order of 10~(19) cm~(-3) and 10~(-2) cm~(-2)/ v s, respectively. The obtained values for the optical bandgap ranged from 2.29 to 2.56 eV, where the amount of the optical bandgap for the thin cilms decreased as the substrate temperature increased.
机译:在该研究中,使用乙酸镉前体使用简单的喷雾热解技术沉积氧化镉(CDO)的薄膜沉积在钠钙玻璃基板上。关于层的结构,电气和光学性质的结果,基板温度范围为280至340℃,喷射速率范围为5-20ml / min,溶液的体积范围为50至125 mL系统地研究过。 X射线衍射(XRD)分析显示,所有薄膜的所有薄膜都具有与单相CDO的FCC结构的多晶性质。分析还显示出与(111),(200),(220)和(311)平面相关的峰。场发射扫描电子显微镜(Fe-SEM)图像显示薄膜的形态表面是球形的。原子力显微镜(AFM)分析证明薄膜的粗糙度范围为21.16至60.9nm。霍尔效应和热电学研究表明,薄膜表现出n型导电性。霍尔效应测量研究还表明,载流子浓度(n)和载流子迁移率分别为10〜(19)cm〜(-3)和10〜(-2)cm〜(-2)/ vs 。所获得的光学带隙的值范围为2.29至2.56eV,其中薄纤维的光学带隙的量随着基板温度的增加而降低。

著录项

  • 来源
    《Journal of materials science》 |2020年第21期|18320-18335|共16页
  • 作者

    M.R.Sayas; M.R.Fadavieslam;

  • 作者单位

    School of Physics Damghan University Damghan Iran;

    School of Physics Damghan University Damghan Iran;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号