Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan,Institute of Nanoengineering and Microsystems, National Tsing Hua University, Hsinchu, 30013, Taiwan,Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan;
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 30076, Taiwan;
Dual photoresist complimentary lithography; inorganic oxide photoresist; patterned sapphire substrate; direct laser writing; sub-micrometer pattern;
机译:应用于蓝宝石衬底的双层光刻胶互补光刻技术,用于产生亚微米图案
机译:用于在蓝宝石衬底上形成亚微米图案的双光刻胶互补光刻技术
机译:纳米球光刻和纳米压印光刻技术在蓝宝石衬底上形成亚微米尺寸的图案
机译:通过双层光致抗蚀剂互补光刻制备的蓝宝石衬底上的亚微米图案
机译:使用先进的计量学和拟合技术对极端紫外光刻光刻胶进行表征。
机译:通过软紫外-纳米压印光刻技术对图案化的Al薄膜进行退火处理大规模制造纳米图案化的蓝宝石衬底
机译:通过软紫外-纳米压印光刻技术对图案化的Al薄膜进行退火处理,大规模制造纳米图案化的蓝宝石衬底