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Design and theoretical investigation of nanograting for XUV outcoupler

机译:XUV输出耦合器纳米光栅的设计与理论研究

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摘要

We have theoretically investigated and optimized a nano-periodical highly-efficient blazed grating, which is used as an outcoupler for extreme-ultraviolet (XUV) radiation. The rigorous coupled-wave analysis (RCWA) with S matrix method is employed to optimize the parameters of the grating. The grating is designed to be etched on top layers of IR reflector, performs as a highly-reflective mirror for IR light and highly-efficient outcoulper for XUV. The diffraction efficiency of-1 order of this XUV outcoupler is greater than 20% in the range near 60 nm, which allows high resolution spectroscopy of the 1s-2s transition in He~+ at around 60 nm with extreme precision. The theoretical calculations are verified by the experimental results.
机译:我们从理论上研究并优化了纳米周期高效闪耀光栅,该光栅可用作极紫外(XUV)辐射的输出耦合器。采用S矩阵法进行严格的耦合波分析(RCWA)来优化光栅参数。该光栅被设计为蚀刻在红外反射器的顶层,用作红外光的高反射镜和XUV的高效输出耦合器。该XUV外耦合器的-1级衍射效率在60 nm附近范围内大于20%,这使得He〜+中1s-2s跃迁在60 nm附近的高分辨率光谱具有极高的精度。实验结果验证了理论计算。

著录项

  • 来源
    《Optical design and testing V》|2012年|855727.1-855727.8|共8页
  • 会议地点 Beijing(CN)
  • 作者单位

    Laboratory of solid state laser sources, Institute of Semiconductors, Chinese academy of sciences, Beijing, 100083, China;

    Laboratory of solid state laser sources, Institute of Semiconductors, Chinese academy of sciences, Beijing, 100083, China;

    Laboratory of solid state laser sources, Institute of Semiconductors, Chinese academy of sciences, Beijing, 100083, China;

    Laboratory of solid state laser sources, Institute of Semiconductors, Chinese academy of sciences, Beijing, 100083, China;

    Laboratory of solid state laser sources, Institute of Semiconductors, Chinese academy of sciences, Beijing, 100083, China;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    diffraction grating; RCWA; S matrix; XUV; nano-optical devices;

    机译:衍射光栅RCWA; S矩阵; XUV;纳米光学器件;

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