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Reflective high-NA projection lenses

机译:反光高NA投影镜头

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Dioptric systems are usually the first choice for the design of an optical system, e.g. a projection lens or a microscope. But in some cases refractive designs suffer from serious drawbacks like chromatic aberration or material problems (cost, quality, absorption, birefringence, etc.). In such cases reflective systems are an attractive alternative. Reflective systems can be subdivided into two classes: on one hand there are systems with central pupil obscuration, e.g. reflective microscopes or telescopes in astronomy, which have a high aperture but only a small field size, on the other hand there are unobscured systems, e.g. reflective relay systems or EUV projection lenses, which have a large field but only small aperture. By the combination of an unobscured and an obscured mirror system one obtains systems with large field and high numerical aperture. We present new designs, which prove this design principle.
机译:屈光系统通常是设计光学系统的首选,例如光学系统。投影镜头或显微镜。但是在某些情况下,折射设计会遭受严重的缺陷,例如色差或材料问题(成本,质量,吸收率,双折射等)。在这种情况下,反射系统是一个有吸引力的选择。反射系统可分为两类:一方面,有些系统具有中央瞳孔遮挡,例如天文学上的反射显微镜或望远镜,它们具有高孔径但只有很小的视场大小,另一方面,它们的系统也很通畅,例如反射中继系统或EUV投影透镜,它们具有大视野,但光圈很小。通过将无遮挡镜系统与无遮挡镜系统组合,可获得具有大视场和高数值孔径的系统。我们提出了新的设计,证明了这一设计原则。

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