Method for manufacturing reflective optical elements of projection exposure apparatus and reflective optical elements for projection exposure apparatus, projection lenses and projection exposure apparatus

摘要

The present invention is for manufacturing a reflective optical element for a projection exposure apparatus 1 comprising a substrate 30 having a substrate surface 31, a protective layer 38 and a layer sub-system 39 suitable for the EUV wavelength range. A method comprising the steps of: a) measuring the substrate surface 31, b) irradiating the substrate 30 with the aid of an electron 36, c) tempering the substrate 30. will be. Furthermore, the present invention relates to a reflective optical element for the EUV wavelength range. Furthermore, the present invention relates to a projection lens having mirrors 18, 19, 20 as reflective optical elements and a projection exposure apparatus 1 having a projection lens.