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Analysis of inter-symbol-interference caused by shift misalignment of two objective lenses in high-NA micro holographic storage

机译:高数值孔径微全息存储中两个物镜偏移未对准引起的符号间干扰分析

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摘要

A high-numerical-aperture (NA) optical system with narrower recording distance in transverse direction is required to increase the areal-density in micro holographic storage. When the first data is recorded by shift misalignment of the two objective lenses (OLs) in transverse direction, the second data can cause inter-symbol-interference (ISI) by pre-recorded first data. A tolerance analysis in transverse direction is required because shift misalignment of the two OLs causes ISI and reduces the total-density. This research analyzes the effects of ISI using a 0.85 NA and 320 nm recording distance between two microgratings in adjacent region. We define the recording tolerance of a single micrograting and the calculate total-density based on blu-ray disc specifications while considering the shift errors. Finally, we define the recording tolerance of successively recorded microgratings in adjacent region and propose recording distance for avoiding ISI.
机译:需要在横向上具有较窄记录距离的高数值孔径(NA)光学系统,以增加微全息存储中的面密度。当通过两个物镜(OL)在横向方向上的偏移未对准来记录第一数据时,第二数据可能会由于预先记录的第一数据而引起符号间干扰(ISI)。需要进行横向公差分析,因为两个OL的偏移未对准会导致ISI并降低总密度。这项研究使用相邻区域中两个微光栅之间的0.85 NA和320 nm记录距离来分析ISI的影响。我们定义单个微光栅的记录公差,并根据蓝光光盘规格计算总密度,同时考虑位移误差。最后,我们定义了相邻区域连续记录的微光栅的记录公差,并提出了避免ISI的记录距离。

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