首页> 外文会议>NATO Advanced Research Workshop on Atomistic Aspects of Epitaxial Growth Jun 25-30, 2001 Dassia, Corfu, Greece >ATOMIC VIEW OF SURFACTANT ACTION IN EPITAXIAL GROWTH: FROM STM TO COMPUTER SIMULATION
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ATOMIC VIEW OF SURFACTANT ACTION IN EPITAXIAL GROWTH: FROM STM TO COMPUTER SIMULATION

机译:表面活性剂在表观生长中的原子观:从STM到计算机模拟

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We have combined experiments and computer simulations to visualize the atomic mechanisms behind the surfactant role of Pb, Co, or Cu atoms deposited on Cu(111) covered with a Pb monolayer quickly getting buried beneath the latter. The presence of the surfactant induces a strong buckling in several substrate layers, which, in turn, modifies many of the system's properties. Atomic diffusion takes place below the surfactant by atomic exchange, while on the clean surface hopping dominates. The activation energy for surface diffusion or the adsorption energies are also significantly altered. These findings have important implications for the synthesis of novel heterostructures such as magnetic superlattices.
机译:我们结合了实验和计算机模拟,以可视化沉积在被Pb单层覆盖的Cu(111)上的Pb,Co或Cu原子的表面活性剂作用背后的原子机理,该表面迅速被埋在后者的下面。表面活性剂的存在会在多个基材层中引起强烈的翘曲,进而改变系统的许多性能。原子扩散是通过原子交换在表面活性剂下方发生的,而在干净的表面上,跳跃是主要的。用于表面扩散的活化能或吸附能也被显着改变。这些发现对新型异质结构如磁性超晶格的合成具有重要意义。

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