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Analytical analysis of a p-n junction with arbitrary shaped doping profile

机译:具有任意形状掺杂轮廓的p-n结的解析分析

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摘要

Analysis of a p-n junction with arbitrary value of the grading coefficient is conduced. Presented solution is linking the grading coefficient of widely used diode's depletion layer capacitance equation with analytically defined impurity doping profile. Derivations are verified against numerical simulations based on the finite element method which experimentally prove the correctness. Also, analytical expressions for other physical quantities of a diode, like electric field, charge, potential, space charge region width, follow straightforwardly.
机译:进行具有任意梯度系数值的p-n结的分析。提出的解决方案是将广泛使用的二极管的耗尽层电容方程的等级系数与分析定义的杂质掺杂分布联系起来。通过基于有限元方法的数值模拟对推导进行了验证,从而通过实验证明了其正确性。同样,二极管的其他物理量(如电场,电荷,电势,空间电荷区域宽度)的解析表达式也可以直接得出。

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