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ELECTRICAL JUNCTION DEVICE WITH LIGHTLY DOPED BUFFER REGION TO PRECISELY LOCATE P-N JUNCTION

机译:轻掺杂缓冲区的电结装置,精确定位P-N结

摘要

PURPOSE: To provide a semiconductor junction device, inhibiting the shift of a junction position to an n-type semiconductor region, which is not a p-type, from a highly p doped semiconductor region by means of diffusion. ;CONSTITUTION: A p doped semiconductor material 26 constituting the base of a hetero-junction bipolar transistor, an n doped semiconductor material 30 which constitutes an emitter and which is not a p-type and a boundary part between a p-type base 26 and an n-type emitter 28 are formed. Furthermore, a p-type doped semiconductor buffer 28, which has a p-type dopant density that is substantially lower than the p-type doped material and has sufficient thickness for forming an electric junction part in substantially the bounder between the p-type doped semiconductor material and the n doped semiconductor material 30 and a means for supplying an electric signal to the base 26 of the p doped material and the emitter 30 of the n doped material are provided.;COPYRIGHT: (C)1995,JPO
机译:用途:提供一种半导体结器件,通过扩散抑制结位置从高p掺杂的半导体区域转移到非p型的n型半导体区域。组成:构成异质结双极晶体管的基极的p型掺杂半导体材料26,构成发射极且不是p型的n型掺杂半导体材料30以及p型基极26与p型基极26之间的边界部分。形成n型发射极28。此外,p型掺杂的半导体缓冲器28具有p型掺杂剂的密度,该p型掺杂剂的密度显着低于p型掺杂的材料,并且具有足够的厚度以在p型掺杂剂之间的实质上的边界中形成电结部。提供了一种半导体材料和n掺杂半导体材料30以及向p掺杂材料的基极26和n掺杂材料的发射极30提供电信号的装置。版权所有:(C)1995,JPO

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