Etching error analysis of dot grating array in micro-lithography fabrication

摘要

This paper described the error effect in fabricating process of dot grating array using the Electro-Beam Lithography (EBL). These errors show the change in the width and depth of each pixel of binary optical element (BOE). It will directly induce the errors of the position and phase of transmission beam. The experimental simulating results are compared with that of the theoretical ones.