首页> 外文会议>Memory Workshop, 2009. IMW '09 >A 90nm Floating Gate 'B4-Flash' Memory Technology- Breakthrough of the Gate Length Limitation on NOR Flash Memory
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A 90nm Floating Gate 'B4-Flash' Memory Technology- Breakthrough of the Gate Length Limitation on NOR Flash Memory

机译:90nm浮栅“ B4-Flash”存储技术-突破了NOR闪存的门长度限制

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A 90 nm floating gate NOR B4-Flash memory with IF (F: minimum feature size) gate length cell has been investigated by using 64 Mbit test chip to evaluate the scalability of B4-Flash memory. 90 nm (=1F) gate length of memory cell is shortest in many NOR flash memories reported previously. Basic program and erase characteristics and robust program disturb immunity of B4-Flash memory utilizing NMOS select transistor in memory cell array have been demonstrated. Furthermore, to simplify the peripheral circuits and reduce a die size, a new charge pump circuit which can generate both positive and negative high voltage at a supply voltage of 1.8 V has been introduced.
机译:使用64 Mbit测试芯片评估了具有IF(F:最小特征尺寸)门长单元的90 nm浮栅NOR B4-Flash存储器,以评估B4-Flash存储器的可扩展性。在先前报道的许多NOR闪存中,存储单元的90 nm(= 1F)栅极长度最短。已经证明了利用存储单元阵列中的NMOS选择晶体管的B4-闪存的基本编程和擦除特性以及鲁棒的编程抗扰性。此外,为了简化外围电路并减小管芯尺寸,已经引入了一种新型的电荷泵电路,该电荷泵电路可以在1.8 V的电源电压下产生正负高电压。

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