机译:了解HfAlO在浮栅闪存中作为互介电介质的潜力和局限性
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
HfAlO; high-k materials; defect density; interpoly dielectrics; flash memory; NAND;
机译:浮栅型闪存基于Hf AlO_x的Interpoly电介质的性能和可靠性
机译:规模化多晶硅介电浮栅存储器件中程序饱和度的研究
机译:高$ k $互电介质堆叠的纳米晶体闪存中保持力的有限元建模
机译:深入研究HfAlO层作为未来闪存的互电介质
机译:硅量子点浮栅闪存设备的计算机建模。
机译:原子层沉积在InP上生长的HfAlO栅介质的能带偏移和界面性质
机译:Sup-45nm节点闪光NAND应用的高k个晶晶电介质彻底调查Si-NaniCrystal存储器