Bragg Grating Coupled High Q Factor Ring Resonator using LSCVD Deposited Si_3N_4 Film

摘要

High-quality Si_3N_4 films with low optical loss were deposited at 150°C using LSCVD. A micro-ring resonator based on as-deposited Si_3N_4 with Q-factor of 5.2×10~4 has been demonstrated. Bragg gratings are fabricated at bus ends to improve coupling efficiency. The LSCVD deposited Si_3N_4 exemplify its viability as a photonic integration platform.