Conventional silicon-based fabrication techniques, ranging from photolithography to various etching processes, are well-established approaches for achieving high-resolution patterns for microelectronics in the semiconductor industry. Although the use of micro fabrication methods in the production of electrochemical energy storage (EES) devices has not really been considered, the adaption of these silicon processing techniques can open up new fabrication routes especially for integrated on-chip energy storage devices. One important consideration for the development of on-chip EES devices is to fabricate a mechanically rigid solid electrolyte with spatial and thickness control, which can be achieved using photopatterning functionality.
展开▼
