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Analytical Modeling of Crosstalk Effects in Coupled Copper Interconnects in Deep Sub Micron Technology

机译:深亚微米技术耦合铜互连串扰效应的分析模型

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Aggressive scaling has led to signal integrity and performance issues in today's copper based interconnects. This paper presents an analytical model for delay and crosstalk in the copper based nanointerconnect systems. The proposed model is compared with SPICE and it is found that the proposed model is almost 100% accurate as SPICE and in an average ~70 times faster than SPICE. Using the proposed analytical model, the crosstalk delay and noise are estimated in copper based nanointerconnects for various submicrometer technology nodes (i.e. 45nm, 32nm, 22nm and 16nm) and interconnect lengths of l00μm, 500μm. 1mm, 5mm and 10mm respectively.
机译:激进的缩放导致当今基于铜的互连中的信号完整性和性能问题。 本文介绍了基于铜的纳米连接系统延迟和串扰的分析模型。 将所提出的模型与香料进行比较,发现所提出的模型几乎100%准确为香料,平均比Spice快70倍。 使用所提出的分析模型,串扰延迟和噪声估计在基于铜的纳米内部,用于各种潜力计技术节点(即45nm,32nm,22nm和16nm),并且L00μm的互连长度为500μm。 分别为1mm,5mm和10mm。

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