Modelling of PVC Processes

摘要

The characterization and the modelling of the flux of the different particles impinging on the growing film, in the PVD techniques, are the main purposes of this paper. The principal techniques used industrially that is to say : vacuum evaporation, magnetron sputtering, vacuum arc deposition and ion plating are considered. The deposition of metallic coatings as well as that of compound materials (ceramics materials) are studied. The objective is to predict and to compare, for each deposition process, the characteristics : nature, energy, etc... of the particles impinging on the growing film. In all cases the creation of the different species, their transport from the source to the substrate are analysed. The metallic and non metallic species are taken into account. Some examples are given to illustrate the influence of the characteristics of the forming particles on the structural properties and morphology of the films obtained by different techniques.